Portable spectrophotometer LSP-A11 is adopted with every test calibration ETC technology, where the standard white boards included in the optical system for great accuracy of every measurement. Equipped with automatic gloss compensation technology to ensures the accuracy of the color measurement data for the surface of different gloss. The measurement of the color of the powder, granules & other materials can be done by adding the powder accessories to this spectrophotometer.
View Catalog| Illumination |
d/8 (Diffused lighting, 8° observation angle) SCS optical engine (light splitting and integration system) ETC (real time calibration technology ) SCI (specular reflection included) & SCE(specular reflection excluded) simultaneous measurement |
|---|---|
| Repeatability |
Light splitting reflectivity：standard deviation within 0.08% Color values:ΔE*ab<=0.015 (After calibration, standard deviation of 30 measurements on test white board, 5 second intervals),br/> Maximum：0.03 |
| Sensor | Dual light path sensor array |
| Size of integrated sphere | 40 mm, alvan diffused reflection surface coating |
| Illumination light source | CLED |
| Light source | A, C, D50, D65, D75, F1, F2, F3, F4, F5, F6, F7, F8, F9, F10, F11, F12, DLF, TL183, TL184, NBF, U30, CWF |
| Wavelength range | 400-700 nm |
| Wavelength interval | 10 nm |
| Half spectral width | 5 nm |
| Reflectivity range & resolution | 0 to 200%, 0.01% |
| Observation angle | 2°/10° |
| Measurement time interval | 0.5 seconds |
| Measurement time | 2 seconds |
| Measuring aperture | 8 mm |
| Color space | CIE-L*a*b, L*C*h, L*u*v, XYZ, Yxy, Reflectance, hunterlab, munsell Mi, CMYK, RGB, HSB |
| Color difference formula | ΔE*ab,ΔE*CH,ΔE*uv,ΔE*cmc(2:1),ΔE*cmc(1:1),ΔE*94,ΔE*00,ΔEab(Hunter),555 ,color classification |
| Other colorimetric indices |
WI (whiteness) (ASTM E313-10,ASTM E313-73,CIE/ISO, AATCC, Hunter, Taube Berger,
Ganz, Stensby) YI (yellowness) (ASTM D1925，ASTM E313-00,ASTM E313-73), Tint(ASTM E313,CIE,Ganz), Metamerism index Milm, adhesive/changing Color fastness, ISO illuminance, 8 gloss |
| Color matching system | Matches |
| UV light source | Not included |
| Work temperature range | 0 to 45℃, relative humidity 80% or below( at 35°C ),no condensation |
| Storage temperature range | 25℃ to 55℃ relative humidity 80% or below(at 35°C ),no condensation |
| Battery capacity | Rechargeable, 20000 continuous tests, 7.4V/6000 mAh |
| Data being displayed | SPD distribution/data，samples color values，color difference values/graph，pass/fail results,color error tendency，color simulation display measurement area，history data color simulation，manual input standard sample generate measurement report |
| Interface | USB, Bluetooth |
| Data storage | 100 test samples , 200 measurement records for each sample |
| Display | True color TFT touch screen |
| Light source longevity | 10 years, 3 million tests |
| Dimension (L*W*H) | 181 × 73 × 112 mm |
| Weight | 550 g |
Portable spectrophotometer has applications in textile, plastic, food, paint, printing, automobile industries, laboratories & on-site applications for quality control purpose.
| Accessories No. | Name |
| 1 | Power cord |
| 2 | USB cable |
| 3 | Driving software |
| 4 | Color QC software |
| 5 | Black and white calibration tile |
Our range of Double Beam UV/VIS spectrophotometers offer long optical path which ensure high accuracy and stability. Its design measures the transmittance of the sample and solvent simultaneously. It is highly precise and performs powerful analysis.
| Wavelength range | 190 to 1100 nm |
| Spectral bandwidth | 2 nm |
| Wavelength Accuracy | ± 0.1nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Double beam 1200 lines/mm |
| Wavelength range | 190 to 1100 nm |
| Spectral bandwidth | 1 nm |
| Wavelength Accuracy | ± 0.1nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Double beam 1200 lines/mm |
| Wavelength range | 190 to 1100 nm |
| Spectral bandwidth | 0.5/1/2/4/5 nm |
| Wavelength Accuracy | ± 0.1nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Double beam 1200 lines/mm |
| Wavelength Range | 190 ~ 1100 nm |
| Setting Wavelength | Automatic |
| Spectral Bandwidth | 0.5 / 1.0 / 2.0 / 4.0 nm adjustable |
| Wavelength Accuracy | ± 0.3 nm |
| Wavelength Repeatability | ≤ 0.1 nm |
We produce a wide range of Nano spectrophotometer for qualitative and quantitative analysis of DNA/RNA in the sample. Our product is highly sensitive and requires only 0.5-2µl of sample for analysis.
| Wavelength range | 200 - 800 nm |
| Path length | 0.2 mm (For high concentration measurement); 1.0 mm (For ordinary) |
| Wavelength accuracy | ± 1 nm |
| Wavelength Resolution | ≤ 3 nm (FWHM at Hg 546 nm) |
| Minimum Sample size | 0.5 - 2.0 µl |
| Wavelength range | 200 - 850 nm |
| Path length | 1 mm, 2 mm, 5 mm, 10 mm |
| Wavelength accuracy | ± 1 nm |
| Wavelength Resolution | 2 nm (FWHM at Hg 546 nm) |
| Minimum Sample size | 0.3 - 2.0 µl |
| Wavelength range | 230 nm, 260 nm, 280 nm |
| Path length | 1.0 mm, 0.2 mm |
| Minimum Sample size | 0.3 - 2.0 µl |
| Absorbance range | 0.2 - 75A (10 mm equivalent absorbance) |
| Absorbance precision | 0.002 Abs |
| Cuvette | No |
| PC | Inbuilt |
| Wavelength range | 190 - 850 nm |
| Path length | 1 mm, 0.2 mm ,0.04 mm |
| Wavelength accuracy | ± 1 nm |
We manufacture highly precise UV/Vis automatic scanning spectrophotometer with wavelength ranging from 190-1100nm. It can perform quantitative measurement, photometric measurement, spectrum scanning, DNA/Protein analysis. It is in demand for its user-friendly operations
| Wavelength range | 190 to 1100 nm |
| Spectral bandwidth | 2 nm |
| Wavelength Accuracy | ± 0.1nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Single beam 1200 lines/mm |
| Wavelength range | 190 to 1100 nm |
| Spectral bandwidth | 1 nm |
| Wavelength Accuracy | ± 0.1nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Single beam 1200 lines/mm |
| Wavelength range | 190 to 1100 nm |
| Spectral bandwidth | 0.5/1/2/4/5 nm |
| Wavelength Accuracy | ± 0.1nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Single beam 1200 lines/mm |
| Wavelength Range | 190 ~ 1100 nm |
| Spectral Bandwidth | 1 nm |
| Wavelength Accuracy | ± 0.3 nm |
| Wavelength Repeatability | 0.2 nm |
| Photometric Range | 0 - 200 % T, (-0.3) to (-3.0) A, 0 - 9999 C |
Labtron provides extensive range of visible spectrophotometer LVS series which can operate over a wavelength range of 320-1100nm. It brings unmatched performance with outstanding accuracy and precision.
| Wavelength Range | 330 to 1000 nm |
| Spectral Bandwidth | 5 nm |
| Wavelength Accuracy | ± 2 nm |
| Wavelength Repeatability | ≤ 1.0 nm |
| Photometric Range | T: 0 to199.9%, A: -0.3 to2.5 Abs, F; 0 to 9999, C: 0 to 9999 |
| Wavelength Range | 335 ~ 1000 nm |
| Spectral Bandwidth | 4 nm |
| Wavelength Accuracy | ± 2 nm |
| Wavelength Repeatability | 1 nm |
| Photometric Range | T: 0 ~ 199.9 % , A: (-0.3) ~ 2.5A bs, F: 0 ~ 9999, C: 0 ~ 9999 |
| Wavelength Range | 325 ~ 1000 nm |
| Setting Wavelength | Automatic |
| Spectral Bandwidth | 2 nm |
| Wavelength Accuracy | ± 1.0 nm |
| Wavelength Repeatability | ≤ 0.2 nm |
| Wavelength Range | 320 ~ 1100 nm |
| Spectral Bandwidth | 4 nm |
| Wavelength Accuracy | ± 0.5 nm |
| Wavelength Repeatability | ≤ 0.2 nm |
| Photometric Range | (-0.3) ~ 3 A |
Labtron Atomic Absorption Spectrophotometer makes use of the modern in technology. It is acquired after thorough research into the desires of the diagnostic community. It has all the power, performance and speed necessitated in today’s modern laboratory.
| Working spectral range | 190 to 900 nm |
| Spectral Bandwith | 0.1, 0.2, 0.4, 1.0 and 2.0 nm |
| Wavelength accuracy | ± 0.15 nm |
| Wavelength repeatability | ≤ 0.04 nm |
| Baseline stability | ≤ 0.002 Abs / 30 min |
| Wavelength range | 190 - 900 nm |
| Spectral Bandwidth | 0.2 nm, 0.4 nm, 0.7 nm, 1.4 nm, 2.4 nm, 5.0 nm |
| Wavelength accuracy | ≤ ± 0.5 nm |
| Wavelength repeatability | ≤ 0.3 nm(single direction) |
| Baseline drift | ± 0.004 Abs / 30 min |
| Wavelength range | 180 - 900 nm |
| Spectral Bandwidth | 0, 0.2, 0.4, 1.0, 2.0nm (Automatic setting) |
| Wavelength accuracy | ≤ 0.15 nm |
| Wavelength repeatability | ± 0.1 nm |
| Baseline drift | ≤ ± 0.002 Abs / 30 min (Static), ≤ ± 0.005 Abs / 30 min (Dynamic) |
| Wavelength range | 180 – 900 nm |
| Spectral Bandwidth | 0 nm, 0.2 nm, 0.4 nm, 1.0 nm, 2.0 nm (5 steps with automatic changeover) |
| Wavelength accuracy | ≤ 0.15 nm |
| Wavelength repeatability | ± 0.1 nm |
| Baseline drift | ≤ ± 0.002 Abs / 30 min (Static) ≤ ± 0.005 Abs / 30 mins (Dynamic) |
| Wavelength Range | 400 nm to 700 nm |
| Wavelength Interval | 10 nm |
| Sensor | High sensitivity silicon photodiode |
| Light Source | LED |
| Working Temperature Range | 0 ℃ to 45 ℃ |
| Wavelength Range | 360 nm to 780 nm |
| Wavelength Pitch | 10 nm |
| Sensor | Silicon Photodiode Array |
| Grating Method | Concave Grating |
| Sphere Diameter | 152 mm |
| Illumination system | d/8 (Diffused lighting, 8° observation angle) SCS optical engine (light splitting and integration system) ETC (real time calibration technology ) SCI (specular reflection included) & SCE(specular reflection excluded) simultaneous measurement |
| Size of integrated sphere | 40 mm, alvan diffused reflection surface coating |
| Illumination light source | CLED |
| Sensor | Dual light path sensor array |
| Light source | A, C, D50, D65, D75, F1, F2, F3, F4, F5, F6, F7, F8, F9, F10, F11, F12, DLF, TL183, TL184, NBF, U30, CWF |
| Illumination system | d/8 (Diffused lighting, 8° observation angle) SCS optical engine (light splitting and integration system) ETC (real time calibration technology ) SCI (specular reflection included) & SCE(specular reflection excluded) simultaneous measurement |
| Size of integrated sphere | 40 mm, alvan diffused reflection surface coating |
| Illumination light source | CLED |
| Sensor | Dual light path sensor array |
| Light source | A, C, D50, D65, D75, F1, F2, F3, F4, F5, F6, F7, F8, F9, F10, F11, F12, DLF, TL183, TL184, NBF, U30, CWF |
| Illumination | 45/0 (45 ring shaped illumination,0° observation angle) |
| Repeatability | Light splitting reflectivity：standard deviation within 0.08% Color values: ΔE*ab |
| Sensor | High sensitivity silicon photodiode |
| Test angle | - |
| Test area | - |
| Illumination | 45/0 (45 ring shaped illumination,0° observation angle) |
| Repeatability | Light splitting reflectivity：standard deviation within 0.08% Color values: ΔE*ab |
| Sensor | High sensitivity silicon photodiode |
| Test angle | 60° |
| Test area | 5 × 10 mm |
| Illumination | d/8 (Diffused lighting, 8° observation angle) SCS optical engine (light splitting and integration system) ETC (real time calibration technology ) SCI (specular reflection included) & SCE(specular reflection excluded) simultaneous measurement |
| Repeatability | Light splitting reflectivity：standard deviation within 0.08% Color values:ΔE*ab |
| Sensor | Blue light enhanced sensor array |
| Size of integrated sphere | 40 mm, alvan diffused reflection surface coating |
| Illumination light source | CLED |
| Illumination | d/8 (Diffused lighting, 8° observation angle) SCS optical engine (light splitting and integration system) ETC (real time calibration technology ) SCI (specular reflection included) & SCE(specular reflection excluded) simultaneous measurement |
| Repeatability | Light splitting reflectivity：standard deviation within 0.08% Color values:ΔE*ab |
| Sensor | Photoelectric diode sensor |
| Size of integrated sphere | 40 mm, alvan diffused reflection surface coating |
| Illumination light source | CLED |
| Light source | 150 W Xenon lamp |
| Excitation wavelength | 200 nm to 900 nm |
| Emission wavelength | 200 nm to 900 nm |
| Excitation slit | 2 nm, 5 nm, 10 nm, 20 nm |
| Emission slit | 2 nm, 5 nm, 10 nm, 20 nm |
| Light source | 150 W Xenon lamp |
| Excitation wavelength | 200 nm to 900 nm |
| Emission wavelength | 200 nm to 900 nm |
| Excitation slit | 2 nm, 5 nm, 10 nm, 20 nm |
| Emission slit | 2 nm, 5 nm, 10 nm, 20 nm |
| Excitation Source | 150 W Xenon Lamp |
| Excitation Wavelength | 200 nm to 900 nm |
| Excitation Slit | 1 nm, 2 nm, 5 nm, 10 nm, 20 nm |
| Emission Slit | 1 nm, 2 nm, 5 nm, 10 nm, 20 nm |
| Wavelength Accuracy | ± 0.4 nm |
| Optical system | Double Beam, Grating 1200 lines/mm |
| Wavelength Range | 190 nm to 1100 nm |
| Spectral Bandwidth | 2 nm |
| Wavelength Accuracy | ± 0.1 nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Double Beam, Grating 1200 lines/mm |
| Wavelength Range | 190 nm to 1100 nm |
| Spectral Bandwidth | 1 nm |
| Wavelength Accuracy | ± 0.1 nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Double Beam, Grating 1200 lines/mm |
| Wavelength Range | 190 nm to 1100 nm |
| Spectral Bandwidth | 2 nm |
| Wavelength Accuracy | ± 0.1 nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
| Optical system | Double Beam, Grating 1200 lines/mm |
| Wavelength Range | 190 nm to 1100 nm |
| Spectral Bandwidth | 1 nm |
| Wavelength Accuracy | ± 0.1 nm @ 656.1 nm, ± 0.3 nm @ all |
| Wavelength Repeatability | ≤ 0.1 nm |
Labtron Equipment Ltd. enables the customer success through innovation, cGMP manufacturing, comprehensive service offerings, ecological and corporate sustainability.
